Mask forming imageable material and use

ABSTRACT

An imageable material can be used to form a mask image for providing a relief image. This imageable material has a simplified structure and consists essentially of, in order: a transparent polymeric carrier sheet and a barrier layer comprising a first infrared radiation absorbing compound. A first ultraviolet radiation absorbing compound is provided in the transparent polymeric carrier sheet or the barrier layer. A non-silver halide thermally sensitive imageable layer is disposed on the barrier layer and comprises a second infrared radiation absorbing compound and a second ultraviolet radiation absorbing compound. A relief image is formed by imaging the imageable material to form an imaged mask material, exposing a relief-forming material with curing radiation through the imaged mask material to form exposed regions and non-exposed regions, and developing the imaged relief-forming material to form a relief image by removing its non-exposed regions.

FIELD OF THE INVENTION

This invention relates to an imageable material that can be thermallyimaged to provide an imaged mask material, which in turn can be used toprovide a relief image such as in a flexographic printing plate. Thisinvention also provides a method for forming a relief image using theimaged mask material.

BACKGROUND OF THE INVENTION

Radiation-sensitive relief-forming materials having a suitablerelief-forming material or layer are known in the art. An importantadvance in the art of making and using masking films to provide reliefimages in such materials is described in U.S. Patent ApplicationPublication 2005/0227182 (Ali et al., hereinafter cited as U.S. '182).For example, this publication describes useful materials and methods forproviding flexographic printing plates having a suitable relief image,using a thermally sensitive mask forming imageable material.

Thus, a relief image can be produced creating a mask, for example bythermal imaging a suitable masking film or element to provide thedesired pattern (generally using an infrared radiation laser undercomputer control) through which a photocurable element is imaged,typically using ultraviolet radiation. For example, U.S. '182 describesmeans for forming an imaged mask material.

For example, the imaged mask material is placed in contact with arelief-forming material and subjected to overall exposure with actinicradiation (for example, UV radiation) to cure the relief-formingmaterial in the unmasked areas and thus form a negative image of theimaged mask material in the relief-forming material. The imaged maskmaterial can then be removed and the uncured regions on therelief-forming material are removed using a development process. Afterdrying, the resulting imaged relief-forming material has a relief imagethat can be used for suitable printing operations.

Advances in imageable materials are described in U.S. Pat. No. 7,799,504(Zwadlo et al.) for making imaged mask materials. These imageablematerials have at least 5 layers coated onto a transparent substrate.

In materials having a relief image, such as flexographic printingplates, the combination of highlight dot retention and reverse linedepths (RLD) define exposure latitude of an imaging system. Highlightdot retention is important for adequate fine resolution printing andadequate reverse line depths are important to provide clean line imageswith good separation in the resulting printed impressions (no halation).Typically, with increased exposure of the relief-forming materialthrough the imageable material (mask), highlight retention is increasedwhile reverse line depths are decreased.

There is a desire to use a considerably simpler design for suchimageable materials used to form masks that can be used to provideexcellent reverse line depths without compromising highlight dotretention.

SUMMARY OF THE INVENTION

To address this need in the art, the present invention provides animageable material consisting essentially of, in order:

(a) a transparent polymeric carrier sheet,

(b) a barrier layer disposed directly on the transparent polymericcarrier sheet, the barrier layer comprising a first infrared radiationabsorbing compound,

wherein either or both of the transparent polymeric carrier sheet andbarrier layer further comprise a first ultraviolet radiation absorbingcompound, and

(c) a non-silver halide thermally sensitive imageable layer disposeddirectly on the barrier layer, the non-silver halide thermally sensitiveimageable layer comprising a second infrared radiation absorbingcompound and a second ultraviolet radiation absorbing compound, bothdispersed within a polymeric binder.

In addition, the present invention also provides a method of making arelief image, the method comprising:

imaging the imageable material of any of the embodiments of the presentinvention to form an imaged mask material,

exposing a relief-forming material with curing radiation through theimaged mask material while they are in complete optical contact, to forman imaged relief-forming material with exposed regions and non-exposedregions, and

developing the imaged relief-forming material to form a relief image byremoving its non-exposed regions.

In many embodiments of this invention, the method of this invention iscarried out using an imageable material of the present invention that isdefined with the following features:

(a) the first ultraviolet radiation absorbing compound is present onlyin the barrier layer, the first and second ultraviolet radiationabsorbing compounds in the imageable material are the same or differentUV-absorbing dyes, and the amount of the first ultraviolet radiationabsorbing compound is less than the amount of the second ultravioletradiation absorbing compound,

(b) the barrier layer in the imageable material comprises aheat-combustible polymer binder that is nitrocellulose, apoly(cyanoacrylate), or a combination thereof, and optionally metaloxide particles or crosslinking agents, or

the barrier layer is a metal or metalized layer,

(c) the non-silver halide thermally sensitive imageable layer in theimageable material comprises a polymer or resin binder that is apolyurethane, poly(vinyl butyral), (meth)acrylamide polymer,nitrocellulose, polyacetal, polymer derived at least in part from any ofmethyl methacrylate, ethyl methacrylate, n-butyl methacrylate, andisobutyl methacrylate, or a combination of two or more of thesematerials,

(d) the transparent polymeric carrier sheet comprises a polyester,polyethylene-polypropylene copolymer, polybutadiene, polycarbonate,polyacrylate, vinyl chloride polymer, hydrolyzed or non-hydrolyzedcellulose acetate, or a combination of two or more of these materials,and optionally comprising an adhesion promoter,

(e) the imageable material comprising one or more of the followingconditions:

-   -   (i) the transparent polymeric carrier sheet has an average dry        thickness of at least 25 μm and up to and including 250 μm,    -   (ii) the barrier layer has an average dry thickness of at least        0.25 μm and up to and including 2.5 μm, and    -   (iii) the non-silver halide thermally sensitive imageable layer        has an average dry thickness of at least 0.5 μm and up to and        including 5 μm, and

when the imageable material further comprises a transparent polymericovercoat layer attached directly to the non-silver halide thermallysensitive imageable layer, and the transparent polymeric overcoat layerhas an average dry thickness of at least 0.05 μm and up to and including1 μm, and

(f) the non-silver halide thermally sensitive imageable layer of theimageable material comprises the polymer or resin binder in an amount ofat least 25 weight % and up to and including 75 weight %.

This invention can also provide a relief-forming assemblage, comprising:

an imaged mask material prepared from the imageable material of thisinvention, which imaged mask material has a mask layer formed from thenon-silver halide thermally sensitive imageable layer, and

a suitable relief-forming material as described herein,

wherein the imaged mask material is arranged in optical contact with therelief-forming material so that the mask layer is directly adjacent therelief-forming material.

The imageable material of the present invention represents anotheradvance in the art. While it has only three essential layers, comparedto more complicated known imageable materials, it provides the sameperformance as those more complicated imageable materials. Thus, theimaging system including the inventive imageable material and its usewith relief-forming materials provides excellent reverse line depths(RLD's) without compromising the highlight dot retention.

Further advantages of the present invention will become apparent fromthe following detailed description of the invention.

DETAILED DESCRIPTION OF THE INVENTION

Definitions

As used herein to define various components of the layers, formulations,compositions, developers, or solutions, unless otherwise indicated, thesingular forms “a,” “an,” and “the” are intended to include one or moreof the components (that is, including plurality referents).

Each term that is not explicitly defined in the present application isto be understood to have a meaning that is commonly accepted by thoseskilled in the art. If the construction of a term would render itmeaningless or essentially meaningless in its context, the termdefinition should be taken from a standard dictionary.

The use of numerical values in the various ranges specified herein,unless otherwise expressly indicated otherwise, are considered to beapproximations as though the minimum and maximum values within thestated ranges were both preceded by the word “about”. In this manner,slight variations above and below the stated ranges can be used toachieve substantially the same results as the values within the ranges.In addition, the disclosure of these ranges is intended as a continuousrange including every value between the minimum and maximum values.

Unless indicated herein, the “imageable material” described herein is anembodiment of the present invention. Such an imageable material can alsobe known as a “mask element,” “mask film,” or “masking element.” Afterbeing imaged, the imaged mask material can also be known as a “mask,”“imaged film,” or “imaged masking film” and contains the mask image usedto form a relief image.

Unless otherwise indicated, percentages are by weight.

The term “relief-forming material” used herein refers to any imageableelement or material in which a relief image can be produced by exposurethrough the imaged mask material. Examples of such relief-formingmaterials are described in detail below but some relief-formingmaterials include flexographic printing plate precursors and printedcircuit boards. Details of useful relief-forming materials are describedin U.S. Patent Application Publication 2005/0227182 (noted above), thedisclosure of which is incorporated herein by reference. In thispublication, the relief-forming materials are generally identified as“radiation-sensitive elements”.

Unless otherwise indicated, the term “ablative” refers to thermalimaging by means of a laser that causes rapid local changes in animageable layer of the imageable material thereby causing thematerial(s) in the imageable layer to be ejected from the imageablelayer. This is distinguishable from other material transfer or imagingtechniques (such as melting, evaporation, or sublimation).

The term “optical contact” means that two layers or two elements (as inthe case of the imaged mask material and a relief-forming material) arein intimate contact so that there is essentially no air-gap or voidbetween the contacted surfaces, thus providing an “air-free interface”.More precisely, two surfaces are defined as being in optical contactwhen the reflection and transmission characteristics of their interfaceare essentially fully described by the Fresnel laws for the reflectionand transmission of light at the refractive-index boundary.

The term “transparent” refers to the ability to transmit at least 95% ofimpacting light.

Imageable Materials

The imageable material of this invention is simpler in construction thanthose known in the art, including those described in U.S. Pat. No.7,799,504 (noted above). Specifically, the imageable material has onlythree essential layers or films as described below, that is, thetransparent polymeric carrier sheet, the barrier layer, and thenon-silver halide thermally sensitive imageable layer. Only these threelayers or films are essential for forming a mask image. However, asnoted below, in some embodiments, a transparent polymeric overcoat canbe attached directly to the non-silver halide thermally sensitiveimageable layer, but this optional feature is not required for forming amask image. Rather, it can be helpful for providing abrasion resistanceas described below.

The imageable material is used to form a mask image that is usedeventually to form a relief image. The imageable material has anon-silver halide thermally sensitive imageable layer and a barrierlayer disposed on a transparent polymeric carrier sheet.

Transparent Polymeric Carrier Sheet:

The transparent polymeric carrier sheet can be any suitable transparentsubstrate or film. Useful transparent polymeric carrier sheets can bebut are not limited to, transparent polymeric films and sheets such aspolyesters including poly(ethylene terephthalate), poly(ethylenenaphthalate), and fluorine polyester polymers,polyethylene-polypropylene copolymers, polybutadienes, polycarbonates,polyacrylates (polymers formed at least in part from one or moreacrylate ethylenically unsaturated monomers), polyvinyl chloride andcopolymers thereof, and hydrolyzed and non-hydrolyzed cellulose acetate,or a combination of two or more of these materials, as a single film orlaminate of multiple films. Generally, the transparent polymeric carriersheet has an average dry thickness of at least 25 μm and up to andincluding 250 μm, or typically at least 75 μm and up to and including175 μm. The average dry thickness is determined similar to that for thenon-silver halide thermally sensitive imageable layer.

For example, a transparent poly(ethylene terephthalate) sheet sold underthe name of MELINEX by DuPont Teijin Films (Hopewell, Va.) is suitableas a transparent polymeric carrier sheet.

If necessary, the transparent polymeric carrier sheet surface can betreated to modify its wettability and adhesion to applied coatings. Suchsurface treatments include but are not limited to corona dischargetreatment and the application of subbing layers.

If desired, the transparent polymeric carrier sheet can also compriseone or more “first” ultraviolet radiation absorbing compounds (asdescribed below for the barrier layer). The one or more compounds can bethe same or different as the first ultraviolet radiation absorbingcompound in the barrier layer, and they can be the same or differentcompounds as the “second” ultraviolet radiation absorbing compounds asdescribed below. Each of these ultraviolet radiation absorbing compoundsgenerally absorbs radiation of at least 150 nm and up to and including450 nm. These compounds can be present in the transparent polymericcarrier sheet in an amount of at least 0.01 weight % and up to andincluding 0.1 weight %, based on the total dry transparent polymericcarrier sheet weight.

In addition, the transparent polymeric carrier sheet can contain one ormore “adhesion promoters” that improve adhesion between it and theadjacent barrier layer. Useful adhesion promoters include but are notlimited to, gelatin, poly(vinylidene chloride),poly(acrylonitrile-co-vinylidene chloride-co-acrylic acid), andpolyethylenimine.

Barrier Layer:

The imageable material of this invention also comprises a barrier layerdisposed directly between the transparent polymeric carried sheet andthe non-silver halide thermally sensitive imageable layer. Suitablebarrier compositions are also described in U.S. '182 (noted above) andreferences cited therein. For example, the barrier layer can compriseone or more polymer binders, particularly, “heat-combustible” polymerbinders such as poly(alkyl cyanoacrylate)s and nitrocellulose, or acombination thereof, or particulate materials such as metal oxideparticles (for example, iron oxide particles) to provide high opticaldensity with respect to relief-image forming curing radiation. Metaloxide particles can be useful for ablative imaging because they canthermally decompose to generate propulsive gases. When the barrier layercomprises one or more polymer binders, those materials are present in anamount of at least 50 weight % and up to and including 99 weight %,based on total dry barrier layer weight.

The barrier layer can alternatively be composed of a metal or metalizedlayer in place or part or all of the polymer binders.

The barrier layer further comprises one or more infrared absorbingcompounds that are collectively identified herein as the “first”infrared radiation absorbing compound to distinguish it, if necessary,from the second infrared radiation absorbing compound in the non-silverhalide thermally sensitive imageable layer. The first infrared radiationabsorbing compound can be one or more dyes or pigments, or mixturesthereof that will provide desired spectral absorption properties and issensitive to radiation in the range of at least 700 nm and up to andincluding 1500 nm and typically at least 750 nm and up to and including1200 nm. It can be a particulate material that is dispersed within thepolymeric binder(s) described below. For example, they can be black dyesor pigments such as carbon black, metal oxides, and other materialsdescribed for example in U.S. '182 (noted above).

One suitable IR-absorbing pigment is carbon black of which there arenumerous types with various particles sizes that are commerciallyavailable. Examples include RAVEN 450, 760 ULTRA, 890, 1020, 1250 andothers that are available from Columbian Chemicals Co. (Atlanta, Ga.) aswell as BLACK PEARLS 170, BLACK PEARLS 480, VULCAN XC72, BLACK PEARLS1100 and others available from Cabot Corp. (Walthan, Mass.). Otheruseful carbon blacks are surface-functionalized with solubilizinggroups. Carbon blacks that are grafted to hydrophilic, nonionicpolymers, such as FX-GE-003 (manufactured by Nippon Shokubai), or whichare surface-functionalized with anionic groups, such as CAB-O-JET® 200or CAB-O-JET® 300 (manufactured by the Cabot Corporation) are alsouseful.

Useful first infrared radiation absorbing compounds include IR dyesincluding but not limited to, cationic infrared-absorbing dyes andphotothermal-bleachable dyes, and crosslinking agents such asmelamine-formaldehyde resins, dialdehydes, phenolics, polyfunctionalaziridines, isocyanates, and urea-formaldehyde epoxies to providegreater thermal resistance.

Examples of suitable IR dyes include but are not limited to, azo dyes,squarilium dyes, croconate dyes, triarylamine dyes, thiazolium dyes,indolium dyes, oxonol dyes, oxazolium dyes, cyanine dyes, merocyaninedyes, phthalocyanine dyes, indocyanine dyes, indotricarbocyanine dyes,oxatricarbocyanine dyes, thiocyanine dyes, thiatricarbocyanine dyes,merocyanine dyes, cryptocyanine dyes, naphthalocyanine dyes, polyanilinedyes, polypyrrole dyes, polythiophene dyes, chalcogenopyryloarylideneand bi(chalcogenopyrylo)polymethine dyes, oxyindolizine dyes, pyryliumdyes, pyrazoline azo dyes, oxazine dyes, naphthoquinone dyes,anthraquinone dyes, quinoneimine dyes, methine dyes, arylmethine dyes,squarine dyes, oxazole dyes, croconine dyes, porphyrin dyes, and anysubstituted or ionic form of the preceding dye classes. Suitable dyesare also described in U.S. Pat. No. 5,208,135 (Patel et al.), U.S. Pat.No. 6,569,603 (Furukawa), and U.S. Pat. No. 6,787,281 (Tao et al.), andEP Publication 1,182,033 (Fijimaki et al.). A general description of oneclass of suitable cyanine dyes is shown by the formula in paragraph[0026] of WO 2004/101280, incorporated herein by reference.

In addition to low molecular weight IR-absorbing dyes, IR dye moietiesbonded to polymers can be used as well. Moreover, IR dye cations can beused as well, that is, the cation is the IR absorbing portion of the dyesalt that ionically interacts with a polymer comprising carboxy, sulfo,phospho, or phosphono groups in the side chains.

Near infrared absorbing cyanine dyes are also useful and are describedfor example in U.S. Pat. No. 6,309,792 (Hauck et al.), U.S. Pat. No.6,264,920 (Achilefu et al.), U.S. Pat. No. 6,153,356 (Urano et al.),U.S. Pat. No. 5,496,903 (Watanate et al.). Suitable dyes may be formedusing conventional methods and starting materials or obtained fromvarious commercial sources including American Dye Source (Baie D'Urfe,Quebec, Canada) and FEW Chemicals (Germany). Other useful dyes for nearinfrared diode laser beams are described, for example, in U.S. Pat. No.4,973,572 (DeBoer).

The infrared radiation absorbing compound is generally present in anamount to provide a transmission optical density of at least 0.025 andtypically of at least 0.05 at the exposing wavelength. Generally, thisis achieved by including at least 0.2 weight % and up to and including 2weight %, or typically at least 0.3 weight % and up to and including 1weight % of the one or more infrared radiation absorbing compounds,based on the total dry weight of the barrier layer.

The first infrared radiation absorbing compound in the barrier layer canbe the same or different chemical compound(s) as the second infraredradiation absorbing compound that is incorporated into the non-silverhalide thermally sensitive imageable layer that is described below. Inmost embodiments, the first and second infrared radiation absorbingcompounds are the same chemical materials. The amounts of the first andsecond infrared radiation absorbing compounds in the imageable materialcan be the same or different. In most embodiments, they are present indifferent amounts in the imageable material.

In addition, in addition to or alternatively to the transparentpolymeric carrier sheet, the barrier layer can comprise one or moreultraviolet radiation absorbing compounds that are collectivelyidentified herein as the “first” ultraviolet radiation absorbingcompound to distinguish it, if necessary, from the second ultravioletradiation absorbing compound in the non-silver halide thermallysensitive imageable layer. These compounds generally absorb radiation ofat least 150 nm and up to and including 450 nm. In most embodiments, thefirst ultraviolet radiation absorbing compounds are provided only in thebarrier layer.

In general, useful ultraviolet radiation absorbing compounds include butare not limited to benzotriazoles, halogenated benzotriazoles,triazines, benzophenones, benzoates, salicylates, substitutedacrylonitriles, cyanoacrylates, benzilidene malonates, oxalanilides, andmixtures thereof.

Examples of useful ultraviolet radiation absorbing compounds include butare not limited to, UV absorbing dyes or UV stabilizers marketed underthe names Uvinul® (BASF), Keyplast® (Keystone Aniline Corporation),Sanduvor® (Sandoz Chemicals Corp.), Hostavin (Clariant), and Tinuvin®(BASF or Ciba). Examples of useful compounds are described in U.S. Pat.No. 5,496,685 (Farber et al.).

The one or more first ultraviolet radiation absorbing compounds aregenerally present in the barrier layer in an amount of at least 0.1weight % and up to and including 10 weight %, or typically at least 0.5weight % and up to and including 5 weight %, based on the total drybarrier layer weight.

The first ultraviolet radiation absorbing compound in the barrier layer(or transparent polymeric carrier sheet) can be the same or differentchemical compound(s) as the second ultraviolet radiation absorbingcompound that is incorporated into the non-silver halide thermallysensitive imageable layer described below. In most embodiments, thefirst and second ultraviolet radiation absorbing compounds are the samechemical materials. The amounts of the first and second ultravioletradiation absorbing compounds in the imageable material are different.In most embodiments, the amount of the first ultraviolet radiationabsorbing compound is less than the amount of the second ultravioletradiation absorbing compound. For example, the amount of the firstultraviolet radiation absorbing compound can be at least 2% and up toand including 20% of the amount of the second ultraviolet radiationabsorbing compound.

Optionally, the barrier layer can comprise a crosslinking agent forimproved handling.

The barrier layer generally has an average dry thickness of at least0.25 μm and up to and including 2.5 μm or typically at least 0.5 μm andup to and including 1.5 μm. The average dry thickness is measured in amanner similar to that for the non-silver halide thermally sensitivelayer described below.

Non-Silver Halide Thermally Sensitive Imageable Layer:

The non-silver halide thermally sensitive imageable layer is generallydisposed directly on the barrier layer as relatively uniform coatings(that is, being substantially continuous and having fairly uniformthickness). In most embodiments, the non-silver halide thermallysensitive imageable layer is a single coated or applied layer, but inother embodiments, there are multiple layers or coatings making up thenon-silver halide thermally sensitive imageable layer disposed directlyon the barrier layer described above.

There is essentially no silver halide present in this layer. In otherwords, no silver halide is purposely added or created in the non-silverhalide thermally sensitive imageable layer.

The non-silver halide thermally sensitive imageable layer generallyincludes one or more second ultraviolet radiation absorbing compoundsthat can be the same or different compounds as the first ultravioletradiation absorbing compounds. The amount of such compounds in thislayer can be at least 10 weight % and up to and including 50 weight %,or typically at least 20 weight % and up to and including 40 weight %,based on the total dry weight of the non-silver halide thermallysensitive imageable layer. Examples of useful second ultravioletradiation absorbing compounds are described above.

The non-silver halide thermally sensitive imageable layer(s) alsocomprises one or more second infrared radiation absorbing compounds thatcan be the same or different as the first infrared radiation absorbingcompound described above. Those compounds are incorporated herein asuseful components of the non-silver halide thermally sensitive imageablelayer.

The second infrared radiation absorbing compound is generally present inthe non-silver halide thermally sensitive imageable layer in an amountto provide a transmission optical density of at least 0.5 and typicallyof at least 0.75 at the exposing wavelength. Generally, this is achievedby including at least 5 weight % and up to and including 25 weight % ofthe one or more second infrared radiation sensitive compounds, based onthe total dry weight of the non-silver halide thermally sensitiveimageable layer.

The non-silver halide thermally sensitive imageable layer can optionallyinclude a fluorocarbon additive for enhancing transfer of a molten orsoftened film and production of halftone dots (that is, pixels) havingwell-defined, generally continuous, and relatively sharp edges. Examplesof useful fluorocarbon additives and amounts are provided in [0087] to[0089] of U.S. '182 (noted above).

Additional optional components of the non-silver halide thermallysensitive imageable layer include but are not limited to, plasticizers,coating aids or surfactants, dispersing aids, and fillers, all of whichare well known in the art as described for example in [0094] to [0096]of U.S. '182 (noted above).

All of the components described above for the non-silver halidethermally sensitive imageable layer are dispersed in one or morepolymers or resins as binders (both synthetic and naturally occurringpolymeric materials) that are capable of dissolving or dispersing thecomponents in a uniform manner throughout the non-silver halidethermally sensitive imageable layer. The one or more polymer or resinbinders are generally present in an amount of at least 25 weight % andup to and including 75 weight %, and typically of at least 35 weight %and up to and including 65 weight %, based on the total dry weight ofthe non-silver halide thermally sensitive imageable layer.

Useful polymer or resin binders include but are not limited to, thematerials described for example in [0081] to [0085] of U.S. '182. Thepolymer or resin binders can also be known as “adhesive binders” asdescribed for example in [0081] of U.S. '182. Examples of such adhesivebinders include but are not limited to, acetyl polymers such aspoly(vinyl butyral)s that can be obtained for example as BUTVAR® B-76from Solution, Inc. (St. Louis, Mo.) and acrylamide polymers that can beobtained as MACROMELT 6900 from Henkel Corp. (Gulph Mills, Pa.).Pressure-sensitive adhesive polymers can also be used for this purpose.

In some embodiments, it is advantageous to use polymer or resin bindersthat are easily thermally combustible, and that generates gases andvolatile fragments at temperature less than 200° C. Examples of thesematerials are nitrocellulose, polycarbonates, polyurethanes, polyesters,polyorthoesters, polyacetals, and copolymers thereof (see for example,U.S. Pat. No. 5,171,650 of Ellis et al., Col. 9, lines 41-50, thedisclosure of which is incorporated herein by reference).

Other useful polymer or resin binders include resins having hydroxylgroups (or hydroxylic polymers) as described in [0082] to [0084] of U.S.'182 (noted above) such as poly(vinyl alcohol)s and cellulosic polymers(such as nitrocellulose). Still other useful polymers arenon-crosslinkable polyesters, polyamides, polycarbamates, polyolefins,polystyrenes, polyethers, polyvinyl ethers, polyvinyl esters, andpolyacrylates and polymethacrylates having alkyl groups with 1 and 2carbon atoms.

Some other useful polymeric binders that have been found to be readilydissolved or dispersed in non-chlorinated organic solvents are describedbelow. They can also be dissolvable or dispersible in chlorinatedorganic solvents. Such useful classes of polymers that meet thesecharacteristics include but are not limited to, terpene resins, phenolicresins, aromatic hydrocarbon resins, polyurethanes (including polyetherpolyurethanes), long-chain acrylate and methacrylate resins. Usefulterpene resins include but are not limited to the SYLVARES terpeneresins such as SYLVARES TR-A25 terpene resin that is available fromArizona Chemical Co. (Jacksonville, Fla.). Useful phenolic resinsinclude but are not limited to, novolac resins such as CK2500 and CK2400novolac resins that are available from Georgia Pacific Resins (Atlanta,Ga.). Aromatic hydrocarbon resins include but are not limited to,NORSOLENE® resins such as NORSOLENE® S-155 resin that are available fromSartomer Co. (Warrington, Pa.). Useful polyurethanes include but are notlimited to, SURKOPAK® 5245 and SURKOFILM® 72S polyurethane resins thatare available from Tennants Inks & Coatings Supplies, Ltd. (Surrey, UK)and NeoRez 322 polyurethane resin that is available from DSM NeoResins(Wilmington, Mass.). Long chain acrylate and methacrylate resins includethose vinyl polymers derived from one or more long chain acrylate ormethacrylate monomers wherein the long alkyl chain has at least 3 carbonatoms. Such monomers include but are not limited to, iso-butylmethacrylate, n-butyl methacrylate, and mixtures thereof.

Other useful polymers are homopolymers and copolymers derived from atleast iso-butyl methacrylate, n-butyl methacrylate, or mixtures thereof.Commercially available primary polymeric materials of this type includeELVACITE® 2045 and ELVACITE® 2046 polymers that are available fromLucite International (Cordova, Tenn.). For example, it was found thatthe commercial polymers available as SURKOPAK® 5245 polyurethane resinand SURKOFILM® 72S polyurethane resin, ELVACITE® 2045 polymericmaterial, and CK 2500 novolac resin are useful.

Particularly useful polymer or resin binders include but are not limitedto, a polyurethane, poly(vinyl butyral), (meth)acrylamide polymer,nitrocellulose, polyacetal, polymer derived at least in part from any ofmethyl methacrylate, ethyl methacrylate, n-butyl methacrylate, andisobutyl methacrylate, or a combination of two or more of thesematerials.

The non-silver halide thermally sensitive imageable layer can furtherinclude plasticizers, coating aids, dispersing agents, fillers,surfactants, fluorocarbons, adhesion promoters, and other additives asdescribed in U.S. '182 (noted above).

The non-silver halide thermally sensitive imageable layer can have anaverage dry thickness of at least 0.5 μm and up to and including 5 μm ortypically of at least 0.8 μm and up to and including 2.5 μm. The averagedry layer thickness is generally an average of 10 different measurementsof a dry cross-sectional image of the layer.

Transparent Polymeric Overcoat Layer:

In some embodiments, the imageable material comprises a transparentpolymeric overcoat layer, although it is not essential to the advantagesof the present invention. The transparent polymeric overcoat layergenerally includes one or more transparent film-forming polymers orresins including but not limited to, a methacrylic acid copolymer (suchas a copolymer of ethyl methacrylate and methacrylic acid) and particlesof one or more fluoropolymers dispersed therein as described, forexample, in U.S. Pat. No. 6,259,465 (Tutt et al.) the disclosure ofwhich is incorporated herein by reference. The transparent polymericovercoat layer can provide abrasion resistance to handling due to thepresence of the particulates. It can also act as a barrier to preventchemical migration from the imaged mask material to the relief-formingmaterial when they are in intimate contact.

When present, the transparent polymeric overcoat layer can be attacheddirectly to the non-silver halide thermally sensitive imageable layerand has an average dry thickness of at least 0.05 μm and up to andincluding 1 μm. Average dry thickness is measured similar to that forthe non-silver halide thermally sensitive imageable layer.

Relief-Forming Materials

Considerable details of useful relief-forming materials such asflexographic printing plate precursors and printed circuit boards areprovided in U.S. '182 (noted above). Such relief-forming materialsgenerally include a suitable dimensionally stable substrate, at leastone radiation-sensitive layer, and optionally a separation layer, coversheet, or metal layer. Suitable substrates include dimensionally stablepolymeric films and aluminum sheets. Polyester films are particularlyuseful. Any radiation-sensitive element that is capable of producing arelief image using the imageable material described above is useful inthe practice of this invention.

The relief-forming material can be positive- or negative-working, buttypically, it is negative-working and generally includes aradiation-sensitive imageable layer (or photocurable or relief-imageforming layer) containing a visible-radiation or UV-radiation curablecomposition that is cured or hardened by polymerization or crosslinkingupon exposure to the curing radiation. For example, the relief-formingmaterial can be UV-sensitive. Many details of various components of theradiation-sensitive elements are provided in U.S. '182 (noted above) andreferences cited therein.

Some embodiments of relief-forming materials also include a removablecover sheet as well as a separation layer, or sometimes referred to asanti-tack layer, that helps removal of the cover sheet and protects theradiation-sensitive imageable layer from fingerprints and other damageand that is disposed between the radiation-sensitive imageable layer andthe cover sheet. Useful separation layer materials include but are notlimited to, polyamides, poly(vinyl alcohols), copolymers of ethylene andvinyl acetate, amphoteric interpolymers, cellulosic polymers, poly(vinylbutyral), cyclic rubbers, and combinations thereof.

In most embodiments, the radiation-sensitive imageable layer comprisesan elastomeric binder, at least one monomer, and an initiator that issensitive to non-IR radiation. In most cases, the initiator will besensitive to UV or visible radiation. Suitable initiator compositionsinclude but are not limited to those described in U.S. Pat. No.4,323,637 (Chen et al.), U.S. Pat. No. 4,427,749 (Gruetzmacher et al.),and U.S. Pat. No. 4,894,315 (Feinberg et al.) the disclosures of whichare incorporated herein by reference.

The elastomeric binder can be one or more polymers or resins that can besoluble, swellable, or dispersible in aqueous, semi-aqueous, or organicsolvent developers (described below) and include but are not limited to,polymers or resins that are soluble, swellable, or dispersible inorganic solvents such as natural or synthetic polymers of conjugateddiolefins, block copolymers, core-shell microgels, and blends ofmicrogels and preformed macromolecular polymers. The elastomeric bindercan comprise at least 65 weight % and up to and including 90 weight %,based on total dry layer weight. More details of such elastomericbinders are provided in [0190] of U.S. '182 (noted above) and referencescited therein.

The radiation-sensitive imageable layer can also include one or moremonomers that are compatible with the elastomeric binder to the extentthat a clear, non-cloudy radiation-sensitive imageable is produced.Monomers for this purpose are well known the art and includeethylenically unsaturated polymerizable compounds having relatively lowmolecular weight (generally less than 30,000 Daltons). Examples ofsuitable monomers include but are not limited to, various mono- andpolyacrylates, acrylate derivatives of isocyanates, esters, andepoxides. Specific monomers are described in [0191] of U.S. '182 (notedabove) and in references cited therein. The typical amount of one ormore monomers in the radiation-sensitive imageable layer is at least 5weight % and up to and including 25 weight %, based on total dry layerweight.

The photoinitiator can be a single compound or combination of compoundsthat are sensitive to visible or UV radiation, or both, and thatgenerates free radicals that initiate the polymerization of themonomer(s) without excessive termination and are generally present in anamount of from about 0.001 weight % and up to and including 10 weight %based on the total dry layer weight. Examples of suitable initiatorsinclude but are not limited to, substituted or unsubstituted polynuclearquinines and further details are provided in [0192] of U.S. '182 (notedabove) and in references cited therein.

The radiation-sensitive imageable layer can include other addenda thatprovide various properties including but not limited to sensitizers,plasticizers, rheology modifiers, thermal polymerization inhibitors,tackifiers, colorants, antioxidants, antiozonants, and fillers, and inamounts that are known in the art.

The thickness of the radiation-sensitive imageable layer can varydepending upon the type of imaged relief-forming material desired. Insome embodiments, a UV-sensitive imageable layer can be at least 500 μmand up to and including 6400 μm in average dry thickness. Average drythickness can be determined similarly to that for the non-silver halidethermally sensitive imageable layer described above.

A spacer layer can be disposed on the radiation-sensitive imageablelayer to that during curing of the radiation-sensitive imageable layerthrough the imaged mask material, the spacer layer is intermediate theimaged mask material. In most embodiments, the spacer layer is in directcontact with both the imaged mask material (first element) and theradiation-sensitive imageable layer of the relief-forming material(second element) so that the first and second elements are in intimatecontact during photocuring. This contact is generally “continuous”,meaning that there are little or no gaps between the first and secondelements. The spacer layer can make removal of the imaged mask materialeasier, and either element in this assemblage can be peel from eachother after curing of the radiation-sensitive imageable layer.

The spacer layer generally has an average dry thickness of at least 0.05μm and up to and including 2 μm, or typically of at least 0.05 μm and upto and including 0.2 μm. The average dry thickness can be determinedsimilarly to that for the non-silver halide thermally sensitiveimageable layer described above.

The spacer layer can be composed of one or more polymers or resinsincluding but not limited to, polyamides, poly(vinyl butyral),(meth)acrylamide polymers, nitrocellulose, polyacetals, polymers derivedat least in part from any of methyl methacrylate, ethyl methacrylate,n-butyl methacrylate, and isobutyl methacrylate or a combination of twoor more of these polymeric materials, which polymers can comprise atleast 75 weight % and up to and including 100 weight % of the dry spacerlayer weight. Various addenda can include if desired, including but notlimited to surfactants, and plasticizers.

In one embodiment, the relief-forming material is a flexographicprinting plate precursor that includes a suitable UV-curable compositionin the radiation-sensitive imageable layer and when exposed through theimaged mask material and developed, provides a relief image in aflexographic printing plate. Such relief-forming materials generallyinclude a suitable substrate, one or more UV-sensitive imageable layerscomprising a photosensitive composition that includes a polymer orprepolymers, and photoinitiator. Examples of commercially availableflexographic printing plate precursors include but are not limited to,FLEXCEL flexographic elements available from Eastman Kodak Company,CYREL® Flexographic plates available from DuPont (Wilmington, Del.),NYLOFLEX® FAR 284 plates available from BASF (Germany), FLEXILIGHT CBUplate available from Macdermid (Denver, Colo.), and ASAHI AFP XDIavailable from Asahi Kasei (Japan).

The relief-forming material can also be used to form a printed circuitboard wherein a conducting layer (also known as a “printing circuit) isformed on a substrate in the pattern dictated by exposure through imagedmask material. Suitable precursors to printed circuit boards generallycomprise a substrate, a metal layer, and a radiations-sensitiveimageable layer. Suitable substrates include but are not limited to,polyimide films, glass-filled epoxy or phenol-formaldehyde or any otherinsulating materials known in the art. The metal layer covering thesubstrate is generally a conductive metal such as copper or an alloy ormetals. The radiation-sensitive imageable layer can include anUV-curable resin, monomers, or oligomers, photoinitiators, and apolymeric binder. Further details of printed circuit boards are providedin [0196] to [0205] of U.S. '182 (noted above).

Forming Imaged Mask Materials

In the practice of this invention, an imaged mask material can be formedby producing exposed and non-exposed regions in the imageable materialof this invention. The choice of imaging mechanism will determine thepossible variations in forming the mask image, as described below.

Exposing the imageable material can be carried out in selected regions,otherwise known as “imagewise exposure”. In some embodiments, imagewiseexposure can be accomplished using thermal radiation from a thermal orinfrared laser that is scanned or rasterized under computer control. Anyof the known scanning devices can be used including flat-bed scanners,external drum scanners, and internal drum scanners. In these devices,the imageable material is secured to the drum or bed, and the laser beamis focused to a spot that can impinge on the imageable material. Two ormore lasers can scan different regions of the imageable materialsimultaneously.

For example, the imageable material can be exposed to infraredradiation, for example, in the range of at least 700 and up to andincluding 1400 nm. Such imageable materials contain one or more infraredradiation absorbing compounds as described above to provide sensitivityto infrared radiation. In these embodiments, the imageable material canbe suitably mounted to an infrared imager and exposed to the infraredradiation using an infrared laser such as a diode laser or Nd:YAG laserthat can be scanned under computer control. Suitable infrared imagersinclude but are not limited to TRENDSETTER imagesetters and ThermoFlexFlexographic CTP imagers available from Eastman Kodak Company used forCTP lithographic plate applications and for imaging flexographicelements, DIMENSION imagesetters available from Presstek (Hudson, N.H.)useful for CTP lithographic plate applications, CYREL® Digital Imager(CDI SPARK) available from Esko-Graphics (Kennesaw, Ga.), and OMNISETTERimagers available from Misomex International (Hudson, N.H.) useful forimaging flexographic elements.

The step of forming a mask image can also include a step of removingeither exposed or non-exposed regions of the non-silver halide thermallysensitive imageable layer. In some embodiments, the exposed regions areremoved, leaving a mask image on the transparent carrier sheet (andbarrier layer disposed thereon).

In other embodiments, a mask image is formed on the carrier sheet (andbarrier layer disposed thereon) by producing exposed and non-exposedregions of the non-silver halide thermally sensitive imageable layer,and removing non-exposed regions of those layers.

In some embodiments, the mask image in the non-silver halide thermallysensitive layer can be cured by subjecting it to heat treatment,provided that the transfer property of the mask image is not adverselyaffected. Heat treatment can be done by a variety of means including butnot limited to, storage in an oven, hot air treatment, or contact with aheated platen or passage through a heated roller device. Heat treatmentis not necessary for curing to take place.

In still other embodiments, a mask image can be formed as noted aboveand the exposed regions are transferred to a receptor sheet. Thereceptor sheet it then removed from the imaged mask material before themask image is transferred to a relief-forming material.

Where a separate receptor sheet is used during imaging of the imageablematerial, the imageable material and receptor sheet are assembled inclose proximity prior to imaging, with the non-silver halide thermallysensitive imageable layer adjacent to the receptive sheet. The term“close proximity” in this context can mean that the non-silver halidethermally sensitive imageable layer and receptor sheet are brought intocontact, or that they do not contact each other but are sufficientlyclose to allow transfer of non-silver halide thermally sensitiveimageable layer upon exposure to thermal imaging radiation. Vacuumhold-down or a mechanical means can be used to secure the imageablematerial and receptor sheet in assembly.

Next, the assembly of the imageable material and receptor sheet can beimagewise exposed using imaging radiation to form a mask image, asdescribed below. Imagewise exposure causes imagewise transfer ofnon-silver halide thermally sensitive imageable layer from the imageablematerial to the receptor sheet. After imaging, the imageable materialcan be removed from the receptor sheet to reveal the mask image on thereceptor sheet.

Several mechanisms for thermal imaging the imageable material arementioned briefly below and further details are provided by U.S. '182(noted above) and references cited therein beginning with paragraphs[0142].

Ablation:

In this mechanism, the exposed regions of the non-silver halidethermally sensitive imageable layer are removed from the imaged maskmaterial by the generation of a gas, leaving a mask image. Specificbinders that decompose upon exposure to heat (such as IR laserirradiation) to rapidly generate a gas can be used. This action is to bedistinguished from other mass transfer techniques in that a chemicalrather than a physical change cases an almost complete transfer of thenon-silver halide thermally sensitive imageable layer rather than apartial transfer.

Melt-Stick Technique:

The exposed areas of the imageable layer can be transferred in a moltenor semi-molten state from the imaged film to a suitable receptor sheetupon exposure to radiation. The exposed areas are characterized byreduced viscosity that provides flowability to the non-silver halidethermally sensitive imageable layer that flows across to and adheres tothe surface of the receptor sheet with greater strength than it adheresto the carrier sheet (and transparent layer disposed thereon). Followingthis physical transfer, the carrier sheet, along with the untransferredimageable layer, is separated from the receptor sheet.

In one embodiment, the mask image comprises the non-exposed regionsremaining on the carrier sheet. In another embodiment, the mask imagecomprises the exposed regions of the non-silver halide thermallysensitive imageable layer that are transferred to the receptor sheet.

Laser-Induced Film Transfer:

With this imaging mechanism, the exposed regions of the non-silverhalide thermally sensitive imageable layer are removed from the carriersheet (and barrier layer disposed thereon) through laser-induced filmtransfer (“LIFT”). The barrier layer can contain a latent crosslinkingagent that reacts with the barrier layer binder to form a high molecularweight network in the exposed regions to provide better control of meltflow phenomena, transfer of more cohesive material to the receptorsheet, and high quality edge sharpness of the resulting mask image.

In one embodiment, the non-silver halide thermally sensitive imageablelayer includes a transferable colorant and an infrared radiationabsorbing compound (such as an IR dye). In another embodiment, thenon-silver halide thermally sensitive imageable layer includes atransferable colorant, a polymeric binder as described above, afluorocarbon additive, a cationic IR dye, and latent crosslinking agentas described above.

The mask image can comprise the non-exposed regions of the non-silverhalide thermally sensitive imageable layer remaining in the imaged maskmaterial, but in other embodiments, the mask image comprises the exposedregions that are transferred to a receptor sheet.

Peel-Apart:

In this imaging mechanism, the exposed regions of the non-thermallysensitive thermally sensitive imageable layer are removed from thecarrier sheet (and barrier layer disposed thereon) using a suitablereceptor sheet based differential adhesion properties in the non-silverhalide thermally sensitive imageable layer. After imagewise exposure ofthe imageable material, the receptor sheet is separated from the carriersheet and either exposed or non-exposed regions remain in the imagedmask material.

Dye Sublimation or Diffusion:

In yet another imaging technique, colorant from exposed regions of thenon-silver halide thermally sensitive imageable layer is removed throughsublimation wherein the colorant is diffused or sublimed withoutsimultaneous transfer of the layer binder. A mask image can be generatedin the imageable material without the need for a receptor sheet. Inother embodiments, a receptor sheet is used to capture the sublimedcolorant. The mask image then comprises the non-silver halide thermallysensitive imageable layer remaining in the imaged mask material. Instill other embodiments, the mask image comprises the colorant that istransferred to a receptor sheet.

Forming Relief Images

After the imaged mask material is formed as described above, it isbrought into complete optical contact with a suitable relief-formingmaterial (described above) that is sensitive to curing radiation(usually UV radiation). This can be accomplished by placing the imagedmask material onto the relief-forming material or vice versa.

In general, the imaged mask material and relief-forming material areplaced in such optical contact as to provide an air-free interface.Generally, this is achieved by laminating the imaged mask material tothe radiation-sensitive element by applying pressure or heat, or bothpressure and heat to form an air-free or gap-free interface. However, ifthe relief-forming material includes a spacer layer (as describedabove), the laminating procedure may be avoided.

Commercially available laminators that provide both heat and pressurecan be used including but not limited to, KODAK model 800XL APPROVALLAMINATOR available from Eastman Kodak Company (Rochester, N.Y.), CODORLPP650 LAMINATOR available from CODOR (Amsterdam, Holland), and LEDCO HDlaminators available from Filmsource (Casselbury, Fla.). Is atransparent polymeric overcoat layer is attached directly to thenon-silver halide thermally sensitive imageable layer of the imageablematerial, it can be before lamination or other means of forming opticalcontact with the relief-forming material. The assemblage of theimageable material and the relief-forming material can be fed into thelaminator at a desired speed, temperature, and pressure.

In one embodiment, the relief-forming material does not have a spacerlayer and pressure alone can be sufficient to achieve an air-freeinterface, as the relief-forming layer in the relief-forming materialcan be tacky, or act as a pressure sensitive adhesive, due to thepresence of monomers.

In still another embodiment, transfer of the imaged mask material can beachieved by using pressure-sensitive adhesion when it is pressed intocontact with the relief-forming material to form an air-free interface.A pressure-sensitive adhesive can be incorporated into the outermostlayer of the relief-forming material, or it can be placed in theseparate spacer layer (described above). Suitable pressure-sensitiveadhesives are known in the art.

In still another embodiment, the imaged mask material can be transferredusing what is known as a “liquid photopolymer process” in which aradiation-sensitive or photopolymer composition is uniformly applied, inliquid or paste form, to the imaged mask material containing the maskimage, for example, by placing the radiation-sensitive compositionbetween the imaged mask material and a transparent support material thatthen becomes the “support” or substrate for the relief-forming material.For example, the transparent support material can be a polymeric film asdescribed above.

In some embodiments, the method further comprises laminating therelief-forming material and imaged mask material prior to imaging therelief-forming material.

After an air-free contact is made between the imaged mask material andthe relief-forming material as described above, the relief-formingmaterial is exposed to curing radiation (see below) through the imagedmask material to form an imaged relief-forming material with exposedregions and non-exposed regions. Thus, the curing radiation is projectedonto the relief-forming material through the mask image thatpreferentially blocks some of the radiation. In unmasked (exposed)regions, curing radiation will cause hardening or curing of theradiation-sensitive composition(s) in the non-silver halide thermallysensitive imageable layer. The mask image should therefore besubstantially opaque to the exposing or curing radiation, meaning thatthe mask image should have a transmission optical density of 2 or moreand typically 3 or more. The unmasked (exposed) regions of the imagedmask material should be substantially transparent meaning that it shouldhave a transmission optical density of 0.5 or less, or even 0.1 or less,and more typically at least 0.5 and up to and including 0.1 or at least0.1 and up to and including 0.3. Transmission optical density can bemeasured using a suitable filter on a densitometer, for example, aMACBETH TR 927 densitometer.

Generally, exposure of the relief-forming material through the imagedmask material containing the mask image is accomplished by floodwiseexposure from suitable irradiation sources (for example, visibleradiation or UV radiation). Exposure can be carried out in the presenceof atmospheric oxygen. Exposure under vacuum is not necessary asair-free contact (or optical contact) has already been made.

In the manufacture of a relief printing plate, such as a flexographicprinting plate, one side of the relief-forming material is generallyfirst exposed to curing radiation through its transparent support (knownas “back exposure”) to prepare a thin, uniform cured layer on thesupport side of the material. The relief-forming material is thenexposed to curing radiation through the imaged mask material containingthe mask image, thereby causing the non-silver halide thermallysensitive composition to harden or cure in the unmasked areas. Unexposedand uncured regions of the radiation-sensitive element are then removedby a developing process (described below), leaving the cured regionsthat define the relief printing surface. The back exposure can beperformed either before or after the air-free contact is made betweenthe imaged mask material and the relief-forming material.

The wavelength or range of wavelengths suitable as the curing radiationwill be dictated by the nature of the relief-forming material. In someembodiments, the curing radiation is ultraviolet radiation at awavelength of at least 150 and up to and including 450 nm. Sources of UVradiation for floodwise or overall exposure include but are not limitedto, carbon arcs, mercury-vapor arcs, fluorescent lamps, electron flashunits, and photographic flood lamps. UV radiation is particularly usefulfrom mercury-vapor lamps and more particularly sun lamps. RepresentativeUV radiation sources include SYLVANIA 350 BLACKLIGHT fluorescent lamp(FR 48T12/350 VL/VHO/180, 115 watts) that has a central emissionwavelength of about 354 nm that is available from Topbulb (East Chicago,Ind.), and BURGESS EXPOSURE FRAME, Model 5K-3343VSII with ADDALUX754-18017 lamp available from Burgess Industries, Inc. (Plymouth,Mass.).

Other suitable sources of UV radiation include platemakers that are ableto both expose the relief-forming material to radiation and to developthe imaged relief-forming material after radiation exposure. Examples ofsuitable platemakers include but are not limited to, KELLEIGH MODEL 310PLATEMAKER available from Kelleigh Corporation (Trenton, N.J.) and theGPP500F PLATE PROCESSOR available from Global Asia Ltd. (Hong Kong).

The time for exposure through the imaged mask material will depend uponthe nature and thickness of the relief-forming material and the sourceof the radiation. For example, in one of embodiment, a FLEXCEL-SRH plateprecursor available from Eastman Kodak Company can be mounted on aKELLEIGH MODEL 310 PLATEMAKER and back exposed to UV-A radiation throughthe transparent support for about 20 seconds to prepare a thin, uniformcured layer on the support side of the relief-forming material. Theassemblage can then be exposed to a UV radiation through the imaged maskmaterial for about 14 minutes. The mask image information is thustransferred to the relief-forming material (such as a flexographic plateprecursor).

In general, the method can also comprise removing the imaged maskmaterial from complete optical contact with the imaged relief-formingmaterial after exposing and before developing. This can be done usingany suitable manner, such as peeling. For example, this can beaccomplished by removing the imaged mask material from complete opticalcontact with the imaged relief-forming material after exposing andbefore developing, by pulling the imaged mask material from the imagedrelief-forming material.

The imaged relief-forming material is then generally developed with asuitable developer to form a relief image. Development serves to removethe non-exposed (uncured) regions of the imaged relief-forming,radiation-sensitive layer, leaving the exposed (cured) regions thatdefine the relief image.

Any known developer can be used in this processing step including thosecontaining chlorinated organic solvents. However, some useful developersare predominantly non-chlorinated organic solvents. By “predominantly”,it is meant that more than 50% (by volume) of the developer comprisesone or more non-chlorinated organic solvents such as aliphatichydrocarbons and long chain alcohols (that is alcohols with at least 7carbon atoms). The remainder of the developers can be chlorinatedorganic solvents that are known in the art for this purpose.

Certain useful developers are predominantly what are known as“perchloroethylene alternative solvents” (PAS). These PAS are generallyvolatile organic compounds typically comprised of mixtures of aliphatichydrocarbons and long-chain alcohols. They are generally stable undernormal room temperature and storage conditions. Examples of suchcommercially available solvents include but are not limited to,PLATESOLV available from Hydrite Chemical Co. (Brookfield, Wis.),NYLOSOLV® available from BASF (Germany), FLEXOSOL® available from DuPont(Wilmington, Del.), OptiSol® available from DuPont (Wilmington, Del.),and SOLVIT® QD available from MacDermid (Denver, Colo.).

Other useful developers are described in U.S. Pat. No. 5,354,645(Schober et al.), the disclosure of which is incorporate herein byreference, and include one or more of diethylene glycol dialkyl ethers,acetic acid esters or alcohols, carboxylic acid esters, and esters ofalkoxy substituted carboxylic acids. Other useful developers aredescribed in U.S. Pat. No. 6,162,593 (Wyatt et al) described developerscomprising diisopropylbenzene (DIPB), U.S. Pat. No. 5,248,502 (Eklund),U.S. Pat. No. 6,248,502 (Eklund), the disclosures of which areincorporated herein by reference.

Additional useful developers are described in U.S. Pat. No. 6,582,886(Hendrickson et al.), the disclosure of which is incorporated herein byreference, and contain methyl esters alone or mixtures of methyl estersand co-solvents such as various alcohols that are soluble in the methylester(s). These developers can also include various non-solvents such aspetroleum distillates naphthas, paraffinic solvents, and mineral oils.

Still other useful developers include chlorohydrocarbons, saturatedcyclic or acyclic hydrocarbons, aromatic hydrocarbons, lower aliphaticketones, or terpene hydrocarbons, but these are not the best as somehave hazardous air pollutants (HAPS) and are subject to stringentgovernmental reporting requirements.

U.S. Patent Application Publication 2010/0068651 (Bradford) describesuseful developers containing dipropylene glycol dimethyl ether (DME)alone or in combination with various co-solvents such as alcohols andaliphatic dibasic acid ethers. The disclosure of this publication isincorporated herein by reference.

Still other useful developers are described in U.S Patent ApplicationPublication 2011/0183260 (Fohrenkamm et al.), the disclosure of which isincorporated herein by reference. Such developers can comprise:

a. one or more esters of monobasic carboxylic acids represented by oneor both of the following Structures (I) and (II):R₁—C(═O)O—(CH₂)_(n)—Ar₁  (I)

wherein R₁ is an alkyl group having 1 to 5 carbon atoms, Ar₁ is asubstituted or unsubstituted phenyl or naphthyl group, and n is 1 to 3,andH—C(═O)OR  (II)

wherein R is a hydrocarbon having 6 to 15 carbon atoms, and

b. one or more aliphatic alcohols, or a combination of one or morealiphatic alcohols and one or more aromatic alcohols.

Some embodiments of such developers comprise:

a. one or more esters of monobasic carboxylic acids represented by thefollowing Structure (I):R₁—C(═O)O—(CH₂)_(n)—Ar₁  (I)

wherein R₁ is an alkyl group having 1 to 5 carbon atoms, Ar₁ is asubstituted or unsubstituted phenyl or naphthyl group, and n is 1 to 3,and

b. one or more aliphatic alcohols, or a combination of one or morealiphatic alcohols and one or more aromatic alcohols.

More specific developers consist essentially of:

a. from about 5 to about 70 weight % of benzyl acetate or propionate,

b. from about 5 to about 40 weight % of 2-ethylhexyl alcohol, octylalcohol, or benzyl alcohol, and

c. from about 5 to about 50 weight % of a petroleum distillate.

Development is usually carried out under known conditions such as for atleast 1 minute and up to and including 20 minutes and at a temperatureof at least 20° C. and up to and including 32° C. The type of developingapparatus and specific developer that are used will dictate the specificdevelopment conditions and can be adapted by a skilled worker in theart.

Post-development processing of the relief image in the imagedrelief-forming material can be suitable under some circumstances.Typical post-development processing includes drying the relief image toremove any excess solvent and post-curing by exposing the relief imageto curing radiation to cause further hardening or crosslinking. Theconditions for these processes are well known to those skilled in theart. For example, the relief image can be blotted or wiped dry, or driedin a forced air or infrared oven. Drying times and temperatures would beapparent to a skilled artisan. Post-curing can be carried out using thesame type of radiation previously used to expose the relief-formingmaterial through the imaged mask material.

Detackification (or “light finishing”) can be used if the relief imagesurface is still tacky. Such treatments, for example, by treatment withbromide or chlorine solutions or exposure to UV or visible radiation,are well known to a skilled artisan.

The resulting relief image can have a depth of at least 2% and up to andincluding 100% of the original thickness of the radiation-sensitivelayer (for example, if this layer is disposed on a support). For aflexographic printing plate, the maximum dry depth of the relief imagecan be from at least 150 μm and up to and including 1000 μm, ortypically at least 200 μm and up to and including 500 μm. For a printedcircuit board, the radiation-sensitive imageable layer is completelyremoved in either the exposed or non-exposed regions, to reveal themetal layer underneath. In such elements, the maximum depth of therelief image depends upon the dry thickness of the radiation-sensitiveimageable layer. Advantageously, in any embodiments, the relief imagecan have shoulder angles of greater than 50°.

Thus, in some embodiments, the method is carried out wherein therelief-forming material is a UV-sensitive flexographic printing plateprecursor and imaging and developing the UV-sensitive flexographicprinting plate precursor provides a flexographic printing plate.

The present invention provides at least the following embodiments andcombinations thereof, but other combinations of features are consideredto be within the present invention as a skilled artisan would appreciatefrom the teaching of this disclosure:

1. An imageable material consisting essentially of, in order:

(a) a transparent polymeric carrier sheet,

(b) a barrier layer disposed directly on the transparent polymericcarrier sheet, the barrier layer comprising a first infrared radiationabsorbing compound,

wherein either or both of the transparent polymeric carrier sheet andbarrier layer further comprise a first ultraviolet radiation absorbingcompound, and

(c) a non-silver halide thermally sensitive imageable layer disposeddirectly on the barrier layer, the non-silver halide thermally sensitiveimageable layer comprising a second infrared radiation absorbingcompound and a second ultraviolet radiation absorbing compound, bothdispersed within a polymeric binder.

2. The imageable material of embodiment 1, further containing atransparent polymeric overcoat layer attached directly to the non-silverhalide thermally sensitive imageable layer.

3. The imageable material of embodiment 1 or 2, wherein the firstultraviolet radiation absorbing compound is present only in the barrierlayer.

4. The imageable material of any of embodiments 1 to 3, wherein thefirst and second ultraviolet radiation absorbing compounds are the sameor different UV-absorbing dyes, and the amount of the first ultravioletradiation absorbing compound is less than the amount of the secondultraviolet radiation absorbing compound.

5. The imageable material of any of embodiments 1 to 4, wherein thebarrier layer comprises a heat-combustible polymer binder that isnitrocellulose, a poly(cyanoacrylate), or a combination thereof, andoptionally metal oxide particles or crosslinking agents, or

the barrier layer is a metal or metalized layer.

6. The imageable material of any of embodiments 1 to 5, wherein thenon-silver halide thermally sensitive imageable layer comprises apolymer or resin binder that is a polyurethane, poly(vinyl butyral),(meth)acrylamide polymer, nitrocellulose, polyacetal, polymer derived atleast in part from any of methyl methacrylate, ethyl methacrylate,n-butyl methacrylate, and isobutyl methacrylate, or a combination of twoor more of these materials, or

the transparent polymeric carrier sheet comprises a polyester,polyethylene-polypropylene copolymer, polybutadiene, polycarbonate,polyacrylate, vinyl chloride polymer, hydrolyzed or non-hydrolyzedcellulose acetate, or a combination of two or more of these materials,and optionally comprising an adhesion promoter.

7. The imageable material of any of embodiments 1 to 6, comprising oneor more of the following conditions:

(i) the transparent polymeric carrier sheet has an average dry thicknessof at least 25 μm and up to and including 250 μm,

(ii) the barrier layer has an average dry thickness of at least 0.25 μmand up to and including 2.5 μm, and

(iii) the non-silver halide thermally sensitive imageable layer has anaverage dry thickness of at least 0.5 μm and up to and including 5 μm,and

when the imageable material further comprises a transparent polymericovercoat layer attached directly to the non-silver halide thermallysensitive imageable layer, and the transparent polymeric overcoat layerhas an average dry thickness of at least 0.05 μm and up to and including1 μm.

8. The imageable material of any of embodiments 1 to 7, wherein thenon-silver halide thermally sensitive imageable layer comprises thepolymer or resin binder in an amount of at least 25 weight % and up toand including 75 weight %.

9. The imageable material of any of embodiments 1 to 8, wherein thefirst and second infrared radiation absorbing compound are the samematerial.

10. A method of making a relief image, the method comprising:

imaging the imageable material of any of embodiments 1 to 9 to form animaged mask material,

exposing a relief-forming material with curing radiation through theimaged mask material while they are in complete optical contact, to forman imaged relief-forming material with exposed regions and non-exposedregions, and

developing the imaged relief-forming material to form a relief image byremoving its non-exposed regions.

11. The method of embodiment 10, further comprising: removing the imagedmask material from complete optical contact with the imagedrelief-forming material after exposing and before developing.

12. The method of embodiment 10 or 11, further comprising:

removing the imaged mask material from complete optical contact with theimaged relief-forming material after exposing and before developing, bypulling the imaged mask material from the imaged relief-formingmaterial.

13. The method of any of embodiments 10 to 12, comprising:

exposing the relief-forming material to UV radiation through the imagedmask material.

14. The method of any of embodiments 10 to 13, wherein therelief-forming material is a UV-sensitive flexographic printing plateprecursor, and imaging and developing the UV-sensitive flexographicprinting plate precursor provides a flexographic printing plate.

15. The method of any of embodiments 10 to 14, further comprising:

laminating the relief-forming material and imaged mask material prior toimaging the relief-forming material.

16. The method of any of embodiments 10 to 15, comprising:

developing the imaged relief-forming material using a developercomprising an ester of a monobasic carboxylic acid, an aliphatichydrocarbon, long-chain alcohol, terpene, or a combination of two ormore of these materials.

17. The method of any of embodiments 10 to 16, wherein therelief-forming material further comprises a spacer layer intermediatethe imaged mask material.

18. The method of embodiment 17, wherein the spacer layer has an averagedry thickness of at least 0.05 μm and up to and including 2 μm.

19. The method of embodiment 17 or 18, wherein the spacer layer has anaverage dry thickness of at least 0.05 μm and up to and including 0.2μm.

20. The method of any of embodiments 10 to 19, wherein:

(a) the first ultraviolet radiation absorbing compound is present onlyin the barrier layer, the first and second ultraviolet radiationabsorbing compounds in the imageable material are the same or differentUV-absorbing dyes, and the amount of the first ultraviolet radiationabsorbing compound is less than the amount of the second ultravioletradiation absorbing compound,

(b) the barrier layer in the imageable material comprises aheat-combustible polymer binder that is nitrocellulose, apoly(cyanoacrylate), or a combination thereof, and optionally metaloxide particles or crosslinking agents, or

the barrier layer is a metal or metalized layer,

(c) the non-silver halide thermally sensitive imageable layer in theimageable material comprises a polymer or resin binder that is apolyurethane, poly(vinyl butyral), (meth)acrylamide polymer,nitrocellulose, polyacetal, polymer derived at least in part from any ofmethyl methacrylate, ethyl methacrylate, n-butyl methacrylate, andisobutyl methacrylate, or a combination of two or more of thesematerials,

(d) the transparent polymeric carrier sheet comprises a polyester,polyethylene-polypropylene copolymer, polybutadiene, polycarbonate,polyacrylate, vinyl chloride polymer, hydrolyzed or non-hydrolyzedcellulose acetate, or a combination of two or more of these materials,and optionally comprising an adhesion promoter,

(e) the imageable material comprising one or more of the followingconditions:

-   -   (i) the transparent polymeric carrier sheet has an average dry        thickness of at least 25 μm and up to and including 250 μm,    -   (ii) the bather layer has an average dry thickness of at least        0.25 μm and up to and including 2.5 μm, and    -   (iii) the non-silver halide thermally sensitive imageable layer        has an average dry thickness of at least 0.5 μm and up to and        including 5 μm, and

when the imageable material further comprises a transparent polymericovercoat layer attached directly to the non-silver halide thermallysensitive imageable layer, and the transparent polymeric overcoat layerhas an average dry thickness of at least 0.05 μm and up to and including1 μm, and

(f) the non-silver halide thermally sensitive imageable layer of theimageable material comprises the polymer or resin binder in an amount ofat least 25 weight % and up to and including 75 weight %.

The following Examples are provided to illustrate the practice of thisinvention and are not meant to be limiting in any manner.

The following materials and methods were used in the examples:

AIRVOL® 205 premix solution is a 10% solids aqueous solution of apoly(vinyl alcohol) that can be obtained from Air Products (Allentown,Pa.).

BUTVAR® B-76 is a poly(vinyl butyral) resin that can be obtained fromSolutia, Inc. (St. Louis, Mo.).

Byk® 333 is a polyether modified polydimethylsiloxane that can beobtained from Byk Chemie (Wallingford, Conn.).

Curcumin is a yellow dye that can be obtained from Cayman Chemicals (AnnArbor, Mich.).

Dyneon™ FC 2211 and 2178 are fluoroelastomers that can be obtained from3M Company (St. Paul, Minn.).

EMAX is a 60:40 copolymer derived from ethyl methacrylate andmethacrylic acid, which copolymer can be obtained from Eastman KodakCompany (Rochester, N.Y.).

Fluon® AD1 is a PTFE dispersion that can be obtained from Asahi GlassFluoropolymers USA.

IR Dye A is an IR absorbing dye having the following structure and wasobtained from Eastman Kodak Company (Rochester, N.Y.).

MEK represents methyl ethyl ketone.

MIBK represents methyl iso-butyl ketone.

NeoRez 322 polyurethane resin that can be obtained from DSM NeoResins(Wilmington, Mass.).

NeoRez U395 is a polyurethane resin that can be obtained from DSMNeoResins (Wilmington, Mass.).

PCA represents a mixture of 70% (weight) poly(methyl cyanoacrylate) and30% (weight) poly(ethyl cyanoacrylate) as a 10% total solids solution in50/50 cyclopentanone/acetone, obtained from Eastman Kodak Company(Rochester, N.Y.).

Sudan Black is a black dye that can be obtained from Aldrich ChemicalsCo. (Milwaukee, Wis.).

Surfynol® FS-80 is a wetting agent that can be obtained from AirProducts & Chemicals, Inc. (Allentown, Pa.).

Uvinul® 3050 is an ultraviolet radiation absorbing dye that can beobtained from BASF (Germany).

Comparative Example 1

An imageable material outside of the present invention was prepared inthe following manner.

A transparent polymeric carrier sheet, formed of a 0.01 cm thickpoly(ethylene terephthalate), was coated with the transparent layerformulation comprising Dyneon™ FC 2211 out of MEK using a #12 wire rodto provide a transparent layer having a dry coverage of 562 mg/m² whendried for 2 minutes at 93° C.

Onto this transparent layer was coated a intermediate layer formulationcontaining Airvol® 205 poly(vinyl alcohol) out of an 80:20water:n-propanol mixture using a #10 wound-wire coating rod. Theresulting coating was dried at 2 minutes at 93° C. to provide a drycoating coverage of about 648 mg/m².

A barrier layer formulation was formed with the components and coatingsolvents listed in the following TABLE I and applied to the driedintermediate layer using a #10 wound-wire coating rod. The resultingcoating was dried at about 93° C. for 2 minutes to form a barrier layerto provide a coating coverage of about 378 mg/m².

TABLE I Barrier Layer Component Amount Formulation Component (% solids)PCA 84 NeoRez U395 5 IR Dye A 11 Acetone 40 parts Cyclopentanone 60parts

On the dried barrier layer, a non-silver halide thermally sensitiveimageable layer was formed using the components and coating solventsshown in the following TABLE II using a #20 wound-wire coating rod. Theresulting coating was dried at about 93° C. for 2 minutes to provide adry coverage of about 1.51 g/m².

TABLE II Non-Silver Halide Thermally Sensitive Imageable Layer ComponentAmount Formulation Components (% solids) Sudan Black 10 Uvinul ® 305014.3 Curcumin 28.7 Nitrocellulose 16 NeoRez U395 8.8 NeoRez U322 8.8 IRDye A 13.5 MEK 5 parts Cyclohexanone 5 parts MIBK 80 parts Ethanol 10parts

A transparent polymeric overcoat layer was formed using the componentsand coating solvents shown in the following TABLE III as applied overthe dried non-silver halide thermally sensitive imageable layer using a#20 wound-wire coating rod. The resulting coating was dried at about 93°C. for 2 minutes to a dry transparent polymeric overcoat layer at acoating coverage of about 120 mg/m².

TABLE III Transparent Polymeric Overcoat Layer Component AmountFormulation Components (% solids) EMAX 61.5 Fluon ® AD1 10.5 Byk ® 33330 Surfynol ® FS-80 10 Airvol ® 205 15 NeoRez U322 8.8 Water 80 partsEthanol 20 parts

The resulting Comparative 1 imageable material was used to prepare aflexographic printing plate as described below.

Comparative Example 2

For Comparative Example 2, an imageable material was prepared asdescribed in Comparative Example 1, except that the transparent layerwas omitted.

Invention Example 1

An imageable material of the present invention was prepared like thatdescribed for Comparative Example 1, except that the transparent layerwas omitted, and the barrier layer was prepared using the components andcoating solvents shown below in TABLE IV and coated using a #12wire-wound coating rod to provide a barrier layer coating at a drycoverage of 1.41 g/m².

TABLE IV Barrier Layer Component Amount Formulation Component (grams)PCA 7.792 Uvinol ® 3050 0.109 IRT IR Dye* 0.043 Curcumin 0.090 Acetone50.0 Cyclopentanone 41.966 *IRT IR dye is an infrared radiationabsorbing dye available from Showa Denko (Japan).Forming Flexographic Printing Plates and Evaluations:

Each of the imageable materials of Comparative Examples 1 and 2 andInvention Example 1 was imaged on a Kodak Trendsetter® 800 Imager (KodakSQUARESPOT head, 830 nm exposure wavelength) to form an imaged maskmaterial containing a mask image. This mask image was then transferredfrom the imaged mask material by laminating it by applying pressure(without heat) to a FLEXEL MXH flexographic printing plate precursorthat is available from Eastman Kodak Company (Rochester, N.Y.), so thatthe interface between the imaged mask material and precursor wasair-free.

The resulting assembly of imaged mask material and flexographic printingplate precursor were exposed through the mask image using a Mekrom 302Exposure frame and developing in a Mekrom 301 processor for time shownin TABLE V below using Flexcel LO-NX developer (available from EastmanKodak Company), followed by normal drying and post curing to provideimaged flexographic printing plates. Before this primary exposure, eachof the precursors was exposed through the back side for 15 seconds.

Each of the resulting flexographic printing plates (Flexcel NXH 0.045,Eastman Kodak Company) was evaluated for Relief (target of about 0.024inch, 0.064 cm), Hilite spacing (target greater than 15), and RLD(target >140 μm).

TABLE V Exposure Relief Hilite RLD Example Time (min) (inch; cm) Spacing(μm) Comparative 1 10 0.024; 0.061 14 171 Comparative 1 12 0.023; 0.05818 169 Comparative 1 14 0.025; 0.064 18 159 Comparative 2 5 0.025; 0.06412 94 Comparative 2 9 0.025; 0.064 18 64 Comparative 2 11 0.025; 0.06418 64 Invention 1 10 0.024; 0.061 13 162 Invention 1 13 0.024; 0.061 15156 Invention 1 16 0.024; 0.061 19 143

The data provided in TABLE V show that use of both the ComparativeExample 1 and Invention Example 1 imageable materials provided goodexposure latitude so that desirable Hilite Spacing and RLD values wereobtained. However, the Comparative Example 2 imageable materialexhibited poor exposure latitude as evidenced by poor RLD values andpoor Hilite Spacing at the lowest exposure time. Thus, the InventionExample 1 imageable film demonstrated significant advantage overComparative Example 2.

Invention Example 1 has several advantages over the imageable film ofComparative Example 1 because the invention imageable film is a simplerconstruction and thus less costly to manufacture and use. In addition,the Comparative Example 1 imageable film can sometimes exhibit internaladhesion failure when it is subjected to multiple flexing and bendingoperations. The Invention Example 1 does not exhibit this problem.

Invention Example 2

Certain lower durometer (softer) flexographic printing plate precursorsused for printing corrugated (cardboard) surfaces have a high adhesivenature. The use of these precursors can require a high peel force toseparate an imaged mask material from the precursor after precursorexposure when using a corrugated flexographic printing plate without ananti-tack layer.

In this Example, a flexographic printing plate precursor was preparedwith a thin spacer layer disposed on the relief-forming material (layer)that was used to reduce the peel force into a more practical range. Thethin spacer layer had a dry thickness of about 0.15 μm. The spacer layerformulation contained the components described in TABLE VI below.

TABLE VI Component WEIGHT (g) Macromelt ® 6900 0.897 Byk ® 333 0.0029n-Propanol 69.250 Toluene 29.700

Macromelt® 6900 is a polyamide material available from Henkel. Byk® 333is a surfactant available from Byk-Chemie. The spacer layer formulationwas coated to provide a dry coating weight of 0.16 g/m² using a #14Meyer bar onto an untreated 4 mil (0.01 cm) poly(ethylene terephthalate)film (Dupont 400AP type).

The coated film was hand-laminated onto a 2.84 mm SRC flexographicprinting plate precursor (Eastman Kodak Company) from which theanti-tack layer had been removed, without added heat. The poly(ethyleneterephthalate) film was then removed and the thin spacer layer wastransferred to the imageable side of the SRC precursor surface.

An imaged mask material (like that described in Invention Example 1) waslaminated to two 2.84 mm SRC precursors, one with the thin spacer layerand one without a spacer layer. The resulting assemblies were then UVexposed through the mask image and the peel force was measured forremoving the imaged mask material from the imaged precursor. The peelforce results were found to be as follows:

No spacer layer 350-700 g_(f)/inch (138-276 g_(f)/cm) With spacer layer30-150 g_(f)/inch (11.8-59 g_(f)/cm)

Peel force was measured using a SP-2100 Peel force tester (Imass, Inc.).The high peel force measured without a spacer layer can result in kinksin the imaged precursor during delamination. No significant differencesin image quality relating to dot retention or RLD (reverse line depth)of the resulting flexographic printing plates were found.

The invention has been described in detail with particular reference tocertain preferred embodiments thereof, but it will be understood thatvariations and modifications can be effected within the spirit and scopeof the invention.

The invention claimed is:
 1. An imageable material consistingessentially of, in order: (a) a transparent polymeric carrier sheet, (b)a barrier layer disposed directly on the transparent polymeric carriersheet, the barrier layer comprising a first infrared radiation absorbingcompound, wherein either or both of the transparent polymeric carriersheet and barrier layer further comprise a first ultraviolet radiationabsorbing compound, and (c) a non-silver halide thermally sensitiveimageable layer disposed directly on the barrier layer, the non-silverhalide thermally sensitive imageable layer comprising a second infraredradiation absorbing compound and a second ultraviolet radiationabsorbing compound, both dispersed within a polymeric binder wherein thefirst ultraviolet radiation absorbing compound and the secondultraviolet absorbing compound are same or different UV-absorbing dyes,and the total amount of the first ultraviolet radiation absorbingcompound in either or both of the transparent polymeric carrier sheetand the barrier layer, is less than the amount of the second ultravioletradiation absorbing compound.
 2. The imageable material of claim 1,further containing a transparent polymeric overcoat layer disposeddirectly to the non-silver halide thermally sensitive imageable layer.3. The imageable material of claim 1, wherein the first ultravioletradiation absorbing compound is present only in the barrier layer. 4.The imageable material of claim 1, wherein the barrier layer comprises aheat-combustible polymer binder that is nitrocellulose, apoly(cyanoacrylate), or a combination thereof, and optionally metaloxide particles or crosslinking agents, or the barrier layer is a metalor metalized layer.
 5. The imageable material of claim 1, wherein thenon-silver halide thermally sensitive imageable layer comprises apolymer or resin binder that is a polyurethane, poly(vinyl butyral),(meth)acrylamide polymer, nitrocellulose, polyacetal, polymer derived atleast in part from any of methyl methacrylate, ethyl methacrylate,n-butyl methacrylate, and isobutyl methacrylate, or a combination of twoor more of these materials, or the transparent polymeric carrier sheetcomprises a polyester, polyethylene-polypropylene copolymer,polybutadiene, polycarbonate, polyacrylate, vinyl chloride polymer,hydrolyzed or non-hydrolyzed cellulose acetate, or a combination of twoor more of these materials, and optionally comprising an adhesionpromoter.
 6. The imageable material of claim 1, comprising one or moreof the following conditions: (i) the transparent polymeric carrier sheethas an average dry thickness of at least 25 μm and up to and including250 μm, (ii) the barrier layer has an average dry thickness of at least0.25 μm and up to and including 2.5 μm, (iii) the non-silver halidethermally sensitive imageable layer has an average dry thickness of atleast 0.5 μm and up to and including 5 μm, (iv) the first ultravioletabsorbing compound is present only in the barrier layer, and when theimageable material further comprises a transparent polymeric overcoatlayer attached directly to the non-silver halide thermally sensitiveimageable layer, and the transparent polymeric overcoat layer has anaverage dry thickness of at least 0.05 μm and up to and including 1 μm.7. The imageable material of claim 1, wherein the non-silver halidethermally sensitive imageable layer comprises the polymeric binder in anamount of at least 25 weight % and up to and including 75 weight %. 8.The imageable material of claim 1, wherein the first and second infraredradiation absorbing compound are the same material.